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| Issue | Title | |
| Vol 3, No 4 (2016) | Ch2FCF3 Gas Flow Rate Effects of SiO2 Plasma Etching Rate on Quartz Crystal Microbalance | Abstract PDF |
| Antonius Prisma Jalu Permana, Dionysius Joseph Djoko HS, Masruroh Masruroh | ||
| Vol 4, No 2 (2017) | The effectiveness study of SnCl2.2H2O masking on the formation of QCM profile using wet etching technique with KOH solution | Abstract PDF |
| Tri Andi Rusly, D.J. Djoko H. Santjojo, Setyawan P. Sakti, Masruroh Masruroh | ||
| 0 - 0 of 2 Items | ||
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