Issue Title
Vol 3, No 4 (2016) Ch2FCF3 Gas Flow Rate Effects of SiO2 Plasma Etching Rate on Quartz Crystal Microbalance Abstract  PDF
Antonius Prisma Jalu Permana, Dionysius Joseph Djoko HS, Masruroh Masruroh
Vol 4, No 2 (2017) The effectiveness study of SnCl2.2H2O masking on the formation of QCM profile using wet etching technique with KOH solution Abstract  PDF
Tri Andi Rusly, D.J. Djoko H. Santjojo, Setyawan P. Sakti, Masruroh Masruroh
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